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TEELEN XTL-12B Inverted Metallurgical Microscopy

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TEELEN Inverted Metallurgical Microscopy XTL-12B uses a limited, far color difference correction system, an internal positioning four-hole converter, and a three-layer mechanical moving platform. The objective magnification of XTL-12B is 10X, 20X, 40X, 50X, suitable for semiconductor silicon wafer inspection, geomaterials analysis, etc.
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Teelen XTL-12B Inverted Metallurgical MicroscopySPEC

Teelen XTL-12B Inverted Metallurgical MicroscopyDetails

Teelen XTL-12B Inverted Metallurgical MicroscopyPacking list

SKU
NB029783
eyepiece
High eye point large field of view flat field eyepiece PL10X/18mm
objective lens
Long working distance flat field color difference professional metallographic objective
Total Magnification
10X、20X、40X、50X
converter
Inner positioning four-hole converter
stage
Three-layer mechanical moving platform, area 180mmX155mm, right-hand low-hand position control, stroke: 75mm × 40mm; metal stage plate, center hole diameter of φ 12mm 
lighting system
Reflection Cora lighting, with variable aperture diaphragm and center adjustable field diaphragm, adaptive 90V-240V wide Voltage 6V30W halogen lamp (optional single 3W LED lamp), Light intensity continuously adjustable
Focusing system
Low-hand coarse fine-tuning coaxial focusing mechanism, coarse motion 38 mm per turn; fine-tuning Accuracy 2um, with elastic adjustment mechanism 
observation head
Hinged trinocular, 45 ° tilt, bilateral +/- 5 diopter adjustable, pupil distance adjustment range: 54-75mm, fixed spectral ratio, binocular: trinocular = 80%: 20% 
XTL-12B
Inverted Metallurgical Microscopy
TEELEN XTL-12B Inverted Metallurgical Microscopy Picture

Instrument Introduction

  • Using professional metallographic objective lenses and flat-field eyepieces, the image quality is good, the resolution is high, and the observation is comfortable.

  • Provides superior image quality and a solid and reliable mechanical structure.

  • The corresponding camera accessories can be selected to collect and save the observation images, and the computer and professional metallographic analysis software images can be used for metallographic image analysis.

  • It is easy to operate and has complete accessories. It is widely used in teaching and scientific research metallographic analysis, semiconductor silicon wafer detection, address mineral analysis , precision engineering measurement and other fields.


FAQ
QIs the price listed on the website the final cost for overseas purchases?
ANo, it isn't. This is the ex-factory price of the product in the Chinese Mainland. In addition to this price, buyers from different countries need to account for additional costs such as shipping fees, tariffs, and others. For specific regional quotes, please consult our customer service or fill out a quotation form.
QWhat is the specific process for purchasing the product?
AFirst, please click on the quotation form on the website and fill in detailed information. Our customer service personnel will then send you a quotation based on your specific country and region, confirming payment and delivery methods. Following this, we proceed with contract signing, payment, and shipment. You can then await delivery.
QWhat should I do if the instrument I purchase needs repair?
AAfter-sales repair for overseas instruments is an unavoidable issue. Our repair terms stipulate that the sender is responsible for the shipping and insurance costs incurred for the repair. Repairs within the warranty period are free, while repair costs beyond the warranty period are determined based on the actual situation.
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