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Chengyue CY-SPC4-PMMA Spinning Coater Spin Coater 10000 rpm programmable homogenizer

SE
Miniaturized aluminum alloy body with acrylic cavity, up to 10000 rpm speed with program-controlled homogenizing function, support 5-stage Linear dispersion storage, suitable for ≤ 4-inch substrate processing.
$1408.00/set
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ChengYue CY-SPC4-PMMA Spin CoaterSPEC

ChengYue CY-SPC4-PMMA Spin CoaterDetails

ChengYue CY-SPC4-PMMA Spin CoaterPacking list

SKU
NB045914
Power Supply
AC220V,50Hz
Speed range
0~10000rpm
Acceleration range
100~5000rpm/s
RPM resolution
1rpm
single step time
3000s
Suitable substrate
Diameter ≤ 4 inches (100mm)
Cavity material
Transparent acrylic
Human Machine Interface
button + LCD screen
Epoxy method
Manual glue drop, optional precision syringe pump
Linear dispersion
Linear dispersion 5 segments each, a total of 5 Linear dispersions can be stored
Extraction port
φ 6mm quick screw interface
Machine size
210*250*180mm
Machine Weight
8kg
Vacuumpump
Dry mechanical pump
pumping rate
50L/min
Vacuumpump Power Supply
AC220V 50/60Hz
CY-SPC4-PMMA
Spin Coater
Miniaturized aluminum alloy body with acrylic cavity, up to 10000 rpm speed with program-controlled homogenizing function, support 5-stage Linear dispersion storage, suitable for ≤ 4-inch substrate processing.
Chengyue CY-SPC4-PMMA Spinning Coater Spin Coater 10000 rpm programmable homogenizer Picture

Product Introduction

CY-SPC4-PMMA homogenizer is designed with a miniaturized design, an aluminum alloy structure, an acrylic cavity, and a beautiful and sturdy appearance. The instrument adopts advanced precision motors, and the maximum speed can reach 8000 rpm; The control relies on buttons and high-brightness LCD screen, and in addition to direct homogenization, it can also pre-store the homogenization curve for programmable homogenization. This instrument effectively guarantees the performance and function of the instrument under the premise of greatly reducing the volume, and is very suitable for laboratory purchase.

Scope of application

The homogenizer can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, which are mainly used in photoresist spin coating, biological culture media production, sol-gel method to make polymer films and other fields.

FAQ
QI want to apply photoresist to silicon wafers in the lab, what spin coater should I choose?
A Recommended Chengyue CY-SPC4-PMMA spin coater. This one is specially designed for laboratories, with a maximum Rotation speed of 8000 rpm, and can evenly apply photoresist to form a film. It uses an acrylic cavity to facilitate the observation of the gluing process, and also supports the pre-storage of 5 homogeneous Linear dispersions, which is suitable for scientific research scenarios that require sexual repeability experiments.
QHow to choose the type that needs the program-controlled homogenizing function?
A This spin coater has its own program control function, and the LCD screen is easy to operate. It can store 5 uniform glue Linear dispersions of each 5 segments. You can set the Rotation speed and time parameters of different materials in advance, and call it with one click during the experiment, which not only ensures Repeatability but also saves operation time. It is suitable for multi-batch Sample Handling.
QI want to apply photoresist in the lab, do you have any recommendations for a suitable spin coater?
A Rotation speed of CY-SPC4-PMMA spinning coater is 8000 rpm, which can uniformly coat the photoresist to form a film, and the acrylic cavity is convenient for observing the gluing process, which is suitable for small batch operation in the laboratory.
QWhat functions should be paid attention to when choosing a spinning coater? What are the advantages of this one?
A It mainly depends on Speed range, control accuracy and applicable substrate size. This Rotation speed is adjustable from 0-10000rpm, supports 5-stage homogeneous Linear dispersion storage, and can handle 4-inch substrates. It is compact but fully functional and cost-effective.
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