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Chengyue CY-SPC4-PP Spinning Coater aluminum alloy structure 10000 rpm, program-controlled homogenization

SE
Adopt precision motor with a maximum speed of 10000 rpm, support program-controlled homogenization, can pre-store 5 homogenization Linear dispersion, miniaturized design saves space
$1548.00/set
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ChengYue CY-SPC4-PP Spin CoaterSPEC

ChengYue CY-SPC4-PP Spin CoaterDetails

ChengYue CY-SPC4-PP Spin CoaterPacking list

SKU
NB045915
Speed range
0~10000rpm
Acceleration range
100~5000rpm/s
RPM resolution
1rpm
single step time
3000s
Suitable substrate
Diameter ≤ 4 inches (100mm)
Cavity material
PP cavity
Human Machine Interface
button + LCD screen
Epoxy method
Manual glue drop, optional precision syringe pump
Linear dispersion
Linear dispersion 5 segments each, a total of 5 Linear dispersions can be stored
Extraction port
φ 6mm quick screw interface
Machine size
210*250*180mm
Machine Weight
8kg
Vacuumpump
Dry mechanical pump
pumping rate
50L/min
Vacuumpump Power Supply
AC220V 50/60Hz
CY-SPC4-PP
Spin Coater
Adopt precision motor with a maximum speed of 10000 rpm, support program-controlled homogenization, can pre-store 5 homogenization Linear dispersion, miniaturized design saves space
Chengyue CY-SPC4-PP Spinning Coater aluminum alloy structure 10000 rpm, program-controlled homogenization Picture

Product Introduction

CY-SPC4-PP homogenizing machine is designed to be miniaturized, with an aluminum alloy structure and PP cavity as a whole, with a beautiful and sturdy appearance. The instrument adopts advanced precision motors, and the maximum speed can reach 8000 rpm; The control relies on buttons and high-brightness LCD screen, and in addition to direct homogenization, it can also pre-store the homogenization curve for programmable homogenization. This instrument effectively guarantees the performance and function of the instrument under the premise of greatly reducing the volume, and is very suitable for laboratory purchase.

Scope of application

The homogenizer can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, which are mainly used in photoresist spin coating, biological culture media production, sol-gel method to make polymer films and other fields.

FAQ
QI want to apply photoresist to silicon wafers in the lab, what spin coater should I choose?
A CY-SPC4-PP spin coater has a maximum Rotation speed of 10000rpm, can uniformly coat photoresist to form a film, and is small in size and suitable for laboratory space.
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