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Chengyue CY-SPC8-B Spin Coater Spin Coater 10000 rpm, touch screen

SE
Miniaturized aluminum alloy structure design, maximum Rotation speed 10000 rpm to ensure film formation uniformity, equipped with 7 inch touch screen can preset 5 segments Linear dispersion, easy to operate and suitable for laboratory use.
$2651.00/set
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ChengYue CY-SPC8-B Spin CoaterSPEC

ChengYue CY-SPC8-B Spin CoaterDetails

ChengYue CY-SPC8-B Spin CoaterPacking list

SKU
NB045919
Speed range
0~10000rpm
Acceleration range
100~5000rpm/s
Rotation speed resolution
1rpm
single step time
3000s
substrate size
Diameter ≤ 8 inches (200mm)
Cavity material
PP engineering materials
Operation mode
7 inch high definition LCD touch screen
Epoxy method
Manual glue drop, optional precision syringe pump
Linear dispersion
Linear dispersion 5 segments each, a total of 5 Linear dispersions can be stored
Extraction port
φ 8mm quick screw interface
Machine size
290×365×260mm
Machine Weight
12kg
Vacuum pump
Dry mechanical pump
pumping rate
50L/min
Power supply Voltage
AC220V 50/60Hz
CY-SPC8-B
Spin Coater
Miniaturized aluminum alloy structure design, maximum Rotation speed 10000 rpm to ensure film formation uniformity, equipped with 7 inch touch screen can preset 5 segments Linear dispersion, easy to operate and suitable for laboratory use.
Chengyue CY-SPC8-B Spin Coater Spin Coater 10000 rpm, touch screen Picture

Introduction

CY-SPC8-B Uniform Uniform Machine has been miniaturized design, the whole adopts aluminum alloy structure, and the cavity is made of PP engineering material, which has a beautiful and solid appearance. The instrument adopts advanced precision motor, and the speed can reach 10,000 rpm, which effectively guarantees the uniformity of film formation.

In addition, this instrument adopts touch screen control, which can preset the homogenization curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase.

Scope of application

The Spin Coater can coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, which are mainly used in photoresist spin coating, biological culture medium production, sol-gel method to make polymer films and other fields.

FAQ
QOur lab needs to apply photoresist to silicon wafers. What spin coater should we choose?
A Recommended into the CY-SPC8-B spin coater, its maximum Rotation speed 10000 rpm can ensure uniform photoresist film formation, and support 8-inch silicon just meet your needs, touch screen operation is also very convenient
QRotation speed and Acceleration of spin coater are important?
A Very important. Chengyue CY-SPC8-B Rotation speed is adjustable from 0-10000 rpm, Acceleration 100-5000rpm/s, which can precisely control the thickness and uniformity of the film, suitable for scientific research experiments on film formation mass requirements
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