This standard specifies the technical requirements, test methods, and Encasement, marking, storage and transportation and safety measures for silane gases used in the electronics industry. Silane gases are widely used in the electronics industry for epitaxial growth of polysilicon and monocrystalline silicon, low temperature chemical vapor deposition (VD) (CVD) and amorphous silicon thin film deposition. The standard ensures the mass and safety of silane gases to meet the high-precision requirements in the electronic manufacturing process.
| Status | Abolish |
|---|---|
| CCS | G86 | ICS | 71.100.20 |
| Release Date | 2009-10-30 00:00:00 | Implementation Date | 2010-05-01 00:00:00 |