GB/T 41064-2021 "Surface chemical analysis, deep profiling, method for determination of deep profiling sputtering rates in X-Rays photoelectron spectroscopy, Auger electron spectroscopy and secondary ion mass spectrometry by single-layer and multi-layer thin films", specifies the method of measuring the deep profiling sputtering rates in correlation spectroscopy using single-layer and multi-layer thin films, and clarifies the test principle, equipment, steps and data processing. The standard provides a unified specification for accurately obtaining sputtering rates, helping to improve the accuracy and reliability of deep profiling results of surface chemical analysis.
| Status | Active |
|---|---|
| CCS | G04 | ICS | 71.040.40 |
| Release Date | 2021-12-31 00:00:00 | Implementation Date | 2022-07-01 00:00:00 |