This standard specifies the technical requirements for physical vapor deposition (VD) TiN films. It is suitable for TiN films prepared by physical vapor deposition (VD) and Miscellaneous methods, and can also be applied to Miscellaneous material deposition layers such as TiC, TiCN, TiAlN, etc. The standard covers the technical specifications, Encasement, marking, transportation and storage requirements of TiN films to ensure stable mass and performance of the films. It is suitable for production and inspection processes in related fields, and provides a technical basis for improving the quality control and application effect of TiN films.
| Status | Active |
|---|---|
| CCS | A29 | ICS | 25.220.20 |
| Release Date | 2002-03-10 00:00:00 | Implementation Date | 2002-08-01 00:00:00 |