GB/T 29505-2013 《Test method for measuring surface roughness on planar surfaces of silicon wafer》 Related products
Measuring methods for flat surface roughness of silicon wafers are specified in detail in GB/T 29505-2013, including Measurement principles and operating procedures for three commonly used devices: Profile Gauge, Interferometer and Scatterometer. The standard applies to asperity measurement on flat silicon wafer surfaces, and specifies standard scanning positions and abbreviations for asperity. The standard does not apply to measuring instruments with wafer edge regions and spatial wavelengths ≤ 10 nm. The standard provides an important technical basis for wafer quality control in the semiconductor industry.
This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
| Status | Active |
|---|---|
| CCS | H80 | ICS | 29.045 |
| Release Date | 2013-05-09 00:00:00 | Implementation Date | 2014-02-01 00:00:00 |
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Extended reading
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