GB/T 40109-2021 focuses on the field of surface chemical analysis and provides secondary ion mass spectrometry methods for deep profiling of boron in silicon. This standard defines the scope of application, explains the principle of the method, and clarifies the required equipment and sample requirements. It specifies the whole process from sample preparation to data collection and analysis in detail, helping scientific researchers and production personnel to accurately obtain the depth distribution information of boron in silicon, and providing key technical support for material research and development and mass control in semiconductor and other related industries.
| Status | Active |
|---|---|
| CCS | G04 | ICS | 71.040.40 |
| Release Date | 2021-05-21 00:00:00 | Implementation Date | 2021-12-01 00:00:00 |