This standard specifies a method for the determination of silicon content in tantalum, niobium and their compounds by Inductance Coupled Plasma Atomic Emission Spectroscopy (AES) (ICP-OES), which is suitable for the determination of silicon content in tantalum, niobium and their hydroxides, oxides, carbide and potassium fluorotantalate. The determination range is 0.0005%~ 0.50%. The standard provides a scientific basis for the quality control and composition analysis of tantalum-niobium materials.
| Status | Active |
|---|---|
| CCS | H14 | ICS | 77.120.99 |
| Release Date | 2020-03-06 00:00:00 | Implementation Date | 2021-02-01 00:00:00 |