GB/T 40110-2021 stipulates the determination of element contamination on the surface of silicon wafers by total reflection X-ray fluorescence spectrometry (TXRF). The standard details the determination principle, instrumentation and equipment requirements, and specifies the pretreatment of silicon wafer samples, measurement operation procedures and data processing methods. With the high Sensitivity of TXRF, trace element contamination on the surface of silicon wafers can be accurately detected, providing key technical support for the semiconductor industry to control the mass of silicon wafers and improve the chip manufacturing process, ensuring that silicon wafers meet strict production standards.
| Status | Active |
|---|---|
| CCS | G04 | ICS | 71.040.40 |
| Release Date | 2021-05-21 00:00:00 | Implementation Date | 2021-12-01 00:00:00 |