GB/T 32999-2016 Deep Profiling in Focused Surface Chemical Analysis, provides a specification for the measurement of sputtering rates using the mechanical Profile Gauge grid cladding method. The standard details the complete process from sample preparation, grid cladding fabrication, to the use of mechanical Profile Gauge measurement and calculation of sputtering rates. Through a unified operation method, sputtering rate data can be accurately obtained, providing reliable support for deep profiling related research and applications. It is suitable for many fields involving surface chemical analysis, such as materials science and semiconductors.
| Status | Active |
|---|---|
| CCS | G04 | ICS | 71.040.40 |
| Release Date | 2016-10-13 00:00:00 | Implementation Date | 2017-09-01 00:00:00 |