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GB/T 24582-2023 《Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method》 Related products

This standard describes the extraction of metal impurities from the surface of polysilicon by acid leaching sampling method and quantitative analysis by Inductance Coupled Plasma Mass Spectrometer (ICP-MS) (ICP-MS). It is suitable for the determination of alkali metals, alkaline earth metals and transition elements (such as sodium, potassium, calcium, iron, nickel, copper, zinc, aluminum, etc.) in solar and electronic grade polysilicon. The measurement range is 0.01 ng/g to ensure that the product meets the relevant purity requirements.

This summary is not the original standard text and is for reference only. For accurate information, please obtain it through official channels.
Status Active
CCS H17
ICS 77.040
Release Date 2023-08-06 00:00:00
Implementation Date 2024-03-01 00:00:00
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