This standard specifies a method for the determination of square resistance of slurry of precious metals for use in microelectronics. The slurry forms a film layer on a ceramic or organic Resin substrate by screen printing. After sintering or curing, the resistance of the film layer is proportional to the length. This standard is suitable for evaluating the resistance characteristics of precious metal slurry in the manufacture of microelectronic devices to ensure that it meets technical requirements.
| Status | Active |
|---|---|
| CCS | H68 | ICS | 77.120.99 |
| Release Date | 2008-03-31 00:00:00 | Implementation Date | 2008-09-01 00:00:00 |