IPRE BH200M-W Computerized Metallurgical Microscopy
BH200M-W
Ipre BH200M-W Computer Metallurgical MicroscopySPEC
Ipre BH200M-W Computer Metallurgical MicroscopyDetails
Ipre BH200M-W Computer Metallurgical MicroscopyPacking list
- SKU
- NB031689
- Optical inspection system
- Optical inspection system for color difference correction
- observation head
- Hinged trinocular, 30 ° tilt, 360 ° swirl/spin, adjustable visibility
- eyepiece
- High eye point large field of view flat field eyepiece PL10X/18mm
- Long distance flat field color difference objective
- LMPL5X /0.125 WD15.51mm；LMPL10X/0.25 WD8.7mm；LMPL50X/0.60 WD5.10mm
- converter
- Inner positioning four-hole converter
- Focusing system
- Low coaxial coarse fretting focusing frame, stroke 25mm, fine-tuning Accuracy 0.002mm, with coarse elastic adjustment device and random limit device, built-in 6V30W transmitted light illumination, Upper/Lower lighting switching
- stage
- Compound double-decked mechanical moving platform, table size 140 * 132mm, moving range: 76mmX50mm, Accuracy 0.1mm.
- lighting system
- Reflection Cora illumination, adaptive wide Voltage 100V-240V, 6V/30W halogen lamp, Light intensity continuously adjustable, with variable aperture diaphragm and field diaphragm, field diaphragm center adjustable
- Color filter
- Yellow, green, blue, matte color filters
- Metallographic analysis system
- JX2016 metallographic analysis software, 3 million camera device, 0.5X adapter mirror interface, micrometer
Introduction
The BH200M-W computerized metallurgical microscope is a trinocular, upright metallographic microscope, which can provide superior image quality and stable operating system, easy operation and complete accessories. It is widely used in teaching and scientific research, metallographic analysis, industrial testing and other fields.
Features
Focusing mechanism
Coarse and fine-tuning coaxial, with mechanical upper limit and tightness adjustment device, coarse adjustment stroke 25mm, fine-tuning accuracy 0.002mm.
Mechanical moving platform
Composite double-layer mechanical mobile platform, low hand position coaxial adjustment, and attached to the mechanical platform 180mm*145mm flat platform, convenient for placing larger size samples.
Lighting system
Epi-Kola illumination, and the design of anti-reflective structure, effectively prevent the interference of reflected light, so that the imaging is clearer, and the field of view contrast is better.
Options
| eyepiece | High eyepoint large field of view plan eyepiece PL10X/18mm, can be equipped with micrometer |
| High eyepoint large field of view eyepiece WF15X/13mm, can be with micrometer | |
| High eyepoint large field of view eyepiece WF20X/10mm, can be equipped with micrometer | |
| Long-pitch plan achromatic objectives | LMPL20X/0.40 WD8.8mm |
| LMPL100X/0.80 WD2.0mm | |
| converter | Internally positioned five-hole converter |
| Polarizing accessories | Polarizer inserts, analyzer inserts |
| Computer | HP Business Jets |