China

SETCAS SC-UV-I UV Ozone Cleaner, Dry Fine Cleaning Equipment

SE
Dry fine cleaning, cleaning bands 185nm and 254nm, using double-wave low-pressure mercury lamps, can be used to clean various single crystal substrates.
$3180.00/set
PromotionLoading...
Coupon
Model:
Certificate

Setcas SC-UV-I Ultraviolet ozone cleaning machineSPEC

Setcas SC-UV-I Ultraviolet ozone cleaning machineDetails

Setcas SC-UV-I Ultraviolet ozone cleaning machinePacking list

SKU
NB039846
material
The fuselage is made of stainless steel as a whole, which is resistant to acid and alkali and corrosion
structure
Drawer type sample table, simple and convenient to take and put the substrate
gas path
Reserve the air inlet interface to enrich the cleaning types of equipment
protect
Drawer opening and closing work interlock with UV lamp to avoid UV damage
Timer
Button timer, digital countdown, intuitive
operation
The cleaning process can be terminated manually at any time
Accessories
Optional ozone neutralizer to avoid ozone damage
Cleaning band
185Nm and 254nm
Average light intensity of 3-5mm from UV lamp
28~32mW/cm²
lamp
Double wave low pressure mercury lamp
Lamp power
150W
Irradiated area
150mm×200mm
Adjustable irradiation distance
5~40mm
Timer working interval
0~99min99s with automatic countdown function
Inlet and outlet
Air inlet: φ8mm, air outlet: φ25mm
Equipment appearance size
250mm(W)×300mm(D)×260mm(H)
Pallet size
160mm(W)×200mm(D)×5~30mm(H)
Product Weight
8 KG
SC-UV-I
Ultraviolet ozone cleaning machine
Dry fine cleaning, cleaning bands 185nm and 254nm, using double-wave low-pressure mercury lamps, can be used to clean various single crystal substrates.
SETCAS SC-UV-I UV Ozone Cleaner, Dry Fine Cleaning Equipment Picture

Introduction

SC-UV series ultraviolet ozone cleaning machine: It is a dry fine cleaning equipment, which can be used to clean various single crystal substrates to ensure better film quality. At the same time, it can also remove photoresist, improve material surface wettability, clean SEM and TEM samples and UV-activated polymers, etc.

Ultraviolet ozone cleaning provides an acid-free, dry and atomic-level cleaning method that does not damage materials, and is especially suitable for removing some organic compounds. The ultraviolet lamp mainly emits light of two wavelengths: 185nm and 254nm, among which the light of 185nm can change the oxygen in the air into ozone, and the light of 254nm can destroy the bonds in the compound (especially the carbon-carbon bond); so the light of these two wavelengths Combination effectively removes organic compounds.