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Chengyue CY-SPC8-F polytetrafluoride material cavity Spinning Coater + heating baking glue

SE
Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.
$5356.00/set
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ChengYue CY-SPC8-F Heated Spinning CoaterSPEC

ChengYue CY-SPC8-F Heated Spinning CoaterDetails

ChengYue CY-SPC8-F Heated Spinning CoaterPacking list

SKU
NB045923
Speed range
0~10000rpm
Acceleration range
100~5000rpm/s
Rotation speed resolution
1rpm
single step time
3000s
Suitable substrate
Diameter ≤ 8 inches (200mm)
Cavity material
polytetrafluoride
Epoxy method
Manual glue drop, optional precision syringe pump
Linear dispersion
Linear dispersion 5 segments each, a total of 5 Linear dispersion can be stored
pumping rate
50L/min
vacuum pump
Dry mechanical pump
heating temperature
RT+~200℃
Heating part
Upper cover heating
Power supply Voltage
AC220V 50/60Hz
Extraction port
φ 8mm quick screw interface
Human Machine Interface
7 inch high definition LCD touch screen
Machine Weight
12kg
Machine size
290*365*260mm
CY-SPC8-F
Heated Spinning Coater
Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.
Chengyue CY-SPC8-F polytetrafluoride material cavity Spinning Coater + heating baking glue Picture

Introduction

CY-SPC8-F Spin Coater has been miniaturized and designed, with aluminum alloy structure and PTFE cavity, which is beautiful and solid in appearance. The instrument adopts advanced precision motor, and the speed can reach 10,000 rpm, which effectively guarantees the uniformity of film formation. In addition, this instrument adopts touch screen control, which can preset the homogenization curve, which greatly simplifies the use process and reduces the learning cost, which is very suitable for laboratory purchase.

Scope of application

The Spin Coatercan coat liquid or colloidal materials on silicon wafers, crystals, quartz, ceramics and other substrates to form thin films, which are mainly used in photoresist spin coating, biological culture medium production, sol-gel method to make polymer films and other fields.

FAQ
QI want to apply photoresist to silicon wafers in the lab, what spin coater should I choose?
A CY-SPC8-F heating type spin coater is recommended. Rotation speed is 10000 rpm, which can ensure uniform photoresist film formation. It also has heating function, which can control solvent volatilization speed and is suitable for photoresist spin coating process.
QWhat homogenizing equipment do sol-gel experiments require?
A It is recommended to use CY-SPC8-F. Its PTFE cavity is corrosion resistant and suitable for treating chemical solvents. It can preset 5-stage homogeneous Linear dispersion and precisely control the film thickness, which just meets the requirements of sol-gel film production.
QI want to apply photoresist on silicon wafer, need heating function, any recommendations?
A Recommended CY-SPC8-F heating type spin coater, its maximum Rotation speed 10000 rpm can ensure uniform film formation, heating temperature up to 200 ℃ suitable for photoresist process, 8 inch capacity compatible with common silicon wafer size, touch screen operation is simple and easy to use.
QWhat equipment does the laboratory need to make sol-gel films?
A CY-SPC8-F spin coater, which uses PTFE cavity corrosion resistance, can preset 5-stage homogeneous Linear dispersion to precisely control the film formation process, heating function helps solvent volatilization and film curing, suitable for sol-gel method Preparation of polymer films.
QWhat functions should be paid attention to when selecting a spinning coater?
A Speed accuracy, heating system and ease of operation are recommended. CY-SPC8-F Rotation speed resolution 1rpm ensures uniform film, upper cover is heated to 200 ° C to meet heat treatment needs, 7 inch touch screen can store 5 Linear dispersion, simplifying the experimental process.
QI want to do photoresist spin coating in the laboratory, need heating function, is there a suitable spin coater recommended?
A Rotation speed up to 10000 rpm, can ensure uniform film formation, and the upper cover heating to 200 ℃, suitable for drying and curing of photoresist, touch screen preset Linear dispersion operation is simple, very suitable for laboratory use.
QWe do sol-gel film, the substrate diameter of 6 inches, need uniform gel and heating, choose which instrument?
A CY-SPC8-F spin coater supports substrates with a diameter of ≤ 8 inches, PTFE cavity is corrosion resistant, heating function helps gel rapid film formation, and homogeneous gel Linear dispersion can be preset for 5 segments to ensure film uniformity. Ideal for sol-gel applications.
QWhen selecting the function of the spin coater, are heating and touch important? Why is CY-SPC8-F recommended?
A Heating can accelerate solvent volatilization to improve film formation mass, touch to simplify operation; CY-SPC8-F is recommended because it integrates heating to 200 ° C and 7-inch touch screen, can store multiple uniform glue Linear dispersion, suitable for a variety of materials coating, low learning cost, laboratory use is very convenient.
QI want to apply photoresist in the lab, which spin coater should I choose?
A CY-SPC8-F heating spin coater is recommended. Rotation speed of 10,000 rpm ensures uniform photoresist film formation; heating temperature up to 200 ℃, suitable for photoresist stoving curing; and touch screen preset Linear dispersion, simple operation, suitable for laboratory photoresist spin coating applications.
QDo sol-gel method to make polymer film, what spinning coater is good?
A Chengyue CY-SPC8-F spin coater. It supports substrates with a diameter of ≤ 8 inches, PTFE cavity is resistant to corrosion, and is suitable for handling chemical solvents. Linear dispersion can be preset in 5 segments, which can precisely control the thickness and uniformity of the film. With heating function, it helps the drying and curing process of the gel.
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