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HuiNuo NBC-12TV2 (150 ℃) heating uniform Spinning Coating Machine, high temperature Spinning Coater

SE
With fast heat exchange (1-3 seconds) and precise temperature control functions, the speed is 100-3000 rpm, the acceleration is 100-3000 rpm, and the room temperature is~ RT + 150 ° C. The heating method is directly controlled by the tray itself.
$5710.00/set
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HuiNuo NBC-12TV2(150℃) Heated Spinning CoaterSPEC

HuiNuo NBC-12TV2(150℃) Heated Spinning CoaterDetails

HuiNuo NBC-12TV2(150℃) Heated Spinning CoaterPacking list

SKU
NB049293
Heating method
The temperature is directly controlled by the chip holder itself, and the heat exchange speed between the silicon wafer and the chip holder is about 1-3 seconds
rotational speed
100-3000rpm, acceleration 100-3000 rpm, 5 speeds, 12 sets of parameter memory
Temperature control mode
Temperature control, the suction cup is directly and quickly raised to the process temperature
Heating time control
1-9999 seconds or 1-9999 minutes
Heating part
Film holder, suction cup, temperature control heating
heating temperature
Room temperature~ RT + 150 ℃
Rotational torque
100Rpm torque greater than 1N.m speed stability
Suction cup
Customized, suitable for item size No. 5-100.
Voltage
220V
power
600W
Host Dimensions
Length 400mm × Width 250mm × Height 350mm
NBC-12TV2(150℃)
Heated Spinning Coater
With fast heat exchange (1-3 seconds) and precise temperature control functions, the speed is 100-3000 rpm, the acceleration is 100-3000 rpm, and the room temperature is~ RT + 150 ° C. The heating method is directly controlled by the tray itself.
HuiNuo NBC-12TV2 (150 ℃) heating uniform Spinning Coating Machine, high temperature Spinning Coater Picture

Introduction

NBC-12TV2 (150°C) Heated Glue Leveler is an advanced equipment designed for high-precision gluing process. It adopts the direct temperature control technology of the sheet tray, the heat exchange speed is as fast as 1-3 seconds, and with the customized suction cup, it can be adapted to the size 5 to 100 items, ensuring a stable and efficient gluing process. Its speed range is 100-3000rpm, acceleration is 100-3000 rpm, with 5 speed adjustments and 12 groups of parameter memory functions, which can meet the diversified process needs. At the same time, the heating time of the equipment can be accurately controlled, and the main machine is compact in size, with a size of 400mm×250mm×350mm, which is suitable for a variety of working scenarios. The uniform machine adopts 220V Voltage and 600W power, which is stable and safe in operation, and is suitable for semiconductors, microelectronics, optical films and other fields, helping users achieve high-quality gluing effects and improve production efficiency and product performance.

Heating component operation process

1. The heating component of the backpack at the back of the homogenizer, the power switch - press, and observe the instrument power-on and display;

2. The timer is not running, RST button - press once, observe the timer - start the countdown;

3. For example, set the temperature of the thermostat of the component to 100 degrees Celsius, observe the display value of the thermostat, observe the flashing of the blue heating indicator, which will be stable for about 1-3 minutes (plus or minus 1 degree Celsius), and detect the surface temperature of the sheet tray in combination with the contact thermometer (pay attention to the contact temperature measurement error);

4. For example, silicon wafers with a diameter of 20mm and a thickness of 1mm should be placed on the tray and heat exchanged for about 1-3 seconds;

5. Combined with the self-provided contact temperature measurement or far-infrared temperature Measurement Instrument to obtain the actual temperature of the object, if it does not meet the expected temperature, the set temperature can be modified through the thermostat, and the temperature of the silicon wafer and other items can be corrected;

FAQ
QI want to apply glue on the silicon wafer, and it needs to be heated to about 100 ° C. Do you have a suitable spin coater recommended?
A We recommend the NBC-12TV2 (150 ° C) heating type spin coater. This device uses direct temperature control of the chip holder, and the heat exchange speed is very fast. It only takes 1-3 seconds for the silicon wafer to reach the set temperature, which is suitable for your gluing process that requires precise temperature control. Its heating Temperature range covers room temperature to 150 ° C, which can meet your needs at 100 ° C.
QWe need to handle substrates of different sizes, from very small to about 100mm in diameter. Can the suction cups of this machine be adapted?
A Yes, please rest assured. Equipped with custom suction cups, this NBC-12TV2 homogenizer is compatible with a wide range of item sizes from No. 5 to No. 100. This means that whether it is your small size experimental sample or a commonly used substrate with a diameter of about 100mm, it can stabilize adsorption and evenly swirl/spin gluing. One machine can meet your diverse size needs, and the selection is flexible.