Spin Coater

Rotation speed 0~ 10000rpm, Acceleration 100~ 5000rpm/s, the cavity material is polytetrafluoride, liquid or colloidal material can be coated on silicon wafers, crystals, quartz, ceramics and other substrates to form a thin film, mainly used in photoresist spin coating, bio-foster base production, sol-gel method for producing polymer films and other fields.

Speed 0~10000rpm, acceleration 100~5000rpm/s, speed resolution 1rpm, cavity material polytetrafluoride, heating temperature ≤ 200 ℃, temperature control mode AIP intelligent temperature control, glue drop mode manual glue drop, exhaust system Vacuumpump.